author ="Madden, David G. and O’Nolan, Daniel and Chen, Kai-Jie and Hua, Carol and Kumar, Amrit and Pham, Tony and Forrest, Katherine A. and Space, Brian and Perry, John J. and Khraisheh, Majeda and Zaworotko, Michael J.",
title  ="Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents",
journal  ="Chem. Commun.",
year  ="2019",
volume  ="55",
issue  ="22",
pages  ="3219-3222",
publisher  ="The Royal Society of Chemistry",
doi  ="10.1039/C9CC00626E",
url  ="http://dx.doi.org/10.1039/C9CC00626E",
abstract  ="Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein{,} we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics{,} thereby enabling one-step LNG processing to CO2 levels of 25 ppm."}